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Sputtered Hf-Ti nanostructures: A segregation and high-temperature stability study
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Metadata
Document Title
Sputtered Hf-Ti nanostructures: A segregation and high-temperature stability study
Author
Polyakov MN, Chookajorn T, Mecklenburg M, Schuh CA, Hodge AM
Name from Authors Collection
Affiliations
University of Southern California; Massachusetts Institute of Technology (MIT); National Science & Technology Development Agency - Thailand; National Metal & Materials Technology Center (MTEC); University of Southern California; University of Southern California
Type
Article
Source Title
ACTA MATERIALIA
ISSN
1359-6454
Year
2016
Volume
108
Page
42583
Open Access
Bronze
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI
10.1016/j.actamat.2016.01.073
Format
Abstract
High-temperature stability and segregation tendency of a Hf-Ti alloy is investigated using specimens sputtered in monolithic and multilayer configurations. Upon annealing at 800 degrees C for 96 h, the alloy shows segregation of Hf and Ti at the nanoscale even though the bulk Hf-Ti phase diagram predicts a homogeneous solid solution. The length scale of segregation is found to depend upon the initial as deposited structure, with the monolithic film showing Ti segregation at grain boundaries, and the multilayered specimens showing a nanostructure of Hf-rich grains and Ti-rich intergranular amorphous regions. The multilayer specimens exhibit similar post-annealing grain diameters even when the initial layer thickness is varied. Thermodynamic Monte Carlo simulations show a solid solution when the bulk constraint is imposed, in line with the phase diagram expectation, and a polycrystalline nanostructure with solute segregated intergranular regions with full equilibration, in general agreement with the experimental observations. (C) 2016 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
Industrial Classification
Knowledge Taxonomy Level 1
Knowledge Taxonomy Level 2
Funding Sponsor
Office of Naval Research [N00014-12-1-0638]; US Army Research Office at MIT [W911NF-14-1-0539]
License
Copyright
Rights
Elsevier
Publication Source
WOS