Low-Temperature Synthesis of Vanadium Dioxide Thin Films by Sol-Gel Dip Coating Method

Abstract

The vanadium dioxide (VO2) thin films were synthesized by sol-gel dipping on a glass slide substrate at low temperature of 500 degrees C in a vacuum tube furnace at a pressure of 2 x 10(-3) mbar by 2-step calcination without an intermediate gas purging. Synthesis conditions, including temperature, vacuum pressure, and calcination steps in the vacuum tube furnace, were investigated to find the optimum condition that promoted the formation of VO2 phase. It was found that the 2nd calcination step was very important in realizing the monoclinic vanadium dioxide (VO2 (M)). The results of the valence electron analysis revealed the outstanding phase of VO2 and a small amount of V2O5 and V2O3 phases. The small crystallites of the VO2 were homogeneously distributed on the surface, and the grain was of an irregular shape of similar to 220-380 nm in size. The film's thickness was in a range of 69-74 nm. The film exhibited a metal-to-insulator transformation temperature of similar to 68 degrees C and good thermochromic property. Visible optical transmittance remained at similar to 40-50% when the sample's temperature changed from 25 to 80 degrees C for a near infrared (NIR) region.